Investigations on the characterization of ion implanted hexagonal boran nitride

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Date

2013

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier

Abstract

The effect of ion implantation on hexagonal boron nitride (h-BN) is studied herein. We use boron as an ion of choice to introduce radiation damage into h-BN, at fluences ranging from 1 x 10 14–1 x 10 16 ions/cm2 and implantation energy ranges from 40 to 160 keV. The thermal dependence is also investigated by varying the annealing temperature from room temperature to 400°C after implantation. Raman spectroscopy showed Raman active defects one of which is possibly related to the formation of cubic boron nitride nanocrystals (nc-BN) within the implanted range. The relationship of these defect induced Raman active peaks was investigated by varying the implantation parameters. The preliminary Transmission Electron Microscopy (TEM) results also are reported briefly.

Description

Keywords

Boron nitride, Ion implantation, Raman spectroscopy, Transmission electron microscopy

Citation

Aradi, E. et al. (2013). Investigations on the characterization of ion implanted hexagonal boran nitride. Nuclear Instruments and Methods in Physics Research, 307: 214-217