Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films

Abstract

In this article, we used a two-step chemical vapor deposition (CVD) method to synthesize methylammonium lead-tin triiodide perovskite films, MAPb1−xSnxI3, with x varying from 0 to 1. We successfully controlled the concentration of Sn in the perovskite films and used Rutherford backscattering spectroscopy (RBS) to quantify the composition of the precursor films for conversion into perovskite films. According to the RBS results, increasing the SnCl2 source amount in the reaction chamber translate into an increase in Sn concentration in the films. The crystal structure and the optical properties of perovskite films were examined by X-ray diffraction (XRD) and UV-Vis spectrometry. All the perovskite films depicted similar XRD patterns corresponding to a tetragonal structure with I4cm space group despite the precursor films having different crystal structures. The increasing concentration of Sn in the perovskite films linearly decreased the unit volume from about 988.4 Å3 for MAPbI3 to about 983.3 Å3 for MAPb0 .39Sn0 .61I3, which consequently influenced the optical properties of the films manifested by the decrease in energy bandgap (Eg) and an increase in the disorder in the band gap. The SEM micrographs depicted improvements in the grain size (0.3–1 μm) and surface coverage of the perovskite films compared with the precursor films.

Description

Keywords

mixed metal-mixed halide perovskites, chemical vapour deposition (CVD), elemental stoichiometry, structure-property relationship

Citation

Magubane, S.S.; Arendse, C.J.; Ngqoloda, S.; Cummings, F.; Mtshali, C.; Bolokang, A.S. Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films. Materials 2021, 14, 3526.