Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films

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dc.contributor.authorMagubane, Siphesihle
dc.contributor.authorArendse, Christopher
dc.contributor.authorNgqoloda, Siphelo
dc.date.accessioned2021-08-31T16:35:07Z
dc.date.available2021-08-31T16:35:07Z
dc.date.issued2021
dc.description.abstractIn this article, we used a two-step chemical vapor deposition (CVD) method to synthesize methylammonium lead-tin triiodide perovskite films, MAPb1−xSnxI3, with x varying from 0 to 1. We successfully controlled the concentration of Sn in the perovskite films and used Rutherford backscattering spectroscopy (RBS) to quantify the composition of the precursor films for conversion into perovskite films. According to the RBS results, increasing the SnCl2 source amount in the reaction chamber translate into an increase in Sn concentration in the films. The crystal structure and the optical properties of perovskite films were examined by X-ray diffraction (XRD) and UV-Vis spectrometry. All the perovskite films depicted similar XRD patterns corresponding to a tetragonal structure with I4cm space group despite the precursor films having different crystal structures. The increasing concentration of Sn in the perovskite films linearly decreased the unit volume from about 988.4 Å3 for MAPbI3 to about 983.3 Å3 for MAPb0 .39Sn0 .61I3, which consequently influenced the optical properties of the films manifested by the decrease in energy bandgap (Eg) and an increase in the disorder in the band gap. The SEM micrographs depicted improvements in the grain size (0.3–1 μm) and surface coverage of the perovskite films compared with the precursor films.en_US
dc.identifier.citationMagubane, S.S.; Arendse, C.J.; Ngqoloda, S.; Cummings, F.; Mtshali, C.; Bolokang, A.S. Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films. Materials 2021, 14, 3526.en_US
dc.identifier.urihttps://doi.org/10.3390/ ma14133526
dc.identifier.urihttp://hdl.handle.net/10566/6566
dc.language.isoenen_US
dc.publisherMaterialsen_US
dc.subjectmixed metal-mixed halide perovskitesen_US
dc.subjectchemical vapour deposition (CVD)en_US
dc.subjectelemental stoichiometryen_US
dc.subjectstructure-property relationshipen_US
dc.titleChemical Vapor Deposited Mixed Metal Halide Perovskite Thin Filmsen_US
dc.typeArticleen_US

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