Enhanced electrochemical glucose sensing performance of CuO:NiO mixed oxides thin film by plasma assisted nitrogen doping

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dc.contributor.authorCummings, F
dc.contributor.authorPalmer, M
dc.contributor.authorMasikini, M
dc.date.accessioned2021-05-20T11:17:38Z
dc.date.available2021-05-20T11:17:38Z
dc.date.issued2021
dc.description.abstractIn this study plasma-assisted nitrogen doping of a CuO–NiO mixed oxide thin film was presented. The as prepared film was also applied as a glucose sensor. The nitrogen species generated during plasma ignition resulted in a beneficial phase transformation of CuO to Cu2O. Characterisation techniques such as XRD, SEM, EIS and Hall Effect etc. measurements were utilized to study the morphology, structural features, doping profile and electrical properties of the sensing material. Device performance electrochemical testing showed that the as-developed sensor (labelled as N–CuO/Cu2O:NiO) showed an ultra-fast response time of 2.5 s with high sensitivity (1131 μA/mM.cm2). The linear range of the sensor was calculated to be up to 2.74 mM of glucose and excellent selectivity towards glucose at an applied potential of +0.67 V vs Ag/AgCl in 0.1 M NaOH electrolyte solution.en_US
dc.identifier.citationCummings, F. et al. (2021). Enhanced electrochemical glucose sensing performance of CuO:NiO mixed oxides thin film by plasma assisted nitrogen doping. Journal of Alloys and Compounds, 853,156900en_US
dc.identifier.issn0925-8388
dc.identifier.urihttp://hdl.handle.net/10566/6175
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.subjectBinder less depositionen_US
dc.subjectCu2Oen_US
dc.subjectCuOen_US
dc.subjectGlucose detectionen_US
dc.subjectNitrogen dopingen_US
dc.subjectPlasma etchingen_US
dc.titleEnhanced electrochemical glucose sensing performance of CuO:NiO mixed oxides thin film by plasma assisted nitrogen dopingen_US
dc.typeArticleen_US

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