Intense pulsed neutron generation based on the principle of plasma immersion ion implantation technique (PIp3s) technique

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dc.contributor.advisorFranklyn, Chris. B.
dc.contributor.advisorLindsay, R
dc.contributor.authorVictor, Motloung, Setumo
dc.date.accessioned2023-06-14T08:56:18Z
dc.date.accessioned2024-10-30T10:23:33Z
dc.date.available2023-06-14T08:56:18Z
dc.date.available2024-10-30T10:23:33Z
dc.date.issued2006
dc.description>Magister Scientiae - MScen_US
dc.description.abstractThe development of a deuterium deuterium/ tritium-deuterium (D-D/ D-T) pulsed neutron generator based on the principle of the Plasma Immersion Ion Implantation 1Pl) technique is presented, in terms of investigating development of a compact system to generate an ultra short burst of mono-energetic neutrons (of order 1910 per second) during a short period of time (.20ps) at repetition rates up to 1 kHz. The system will facilitate neutron detection techniques, such as neutron back-scattering, neutron radiography and time-of-flight activation analysis. Aspects addressed in developing the system includes (a) characterizing the neutron spectra generated as a function of the target configuration/ design to ensure a sustained intense neutron flux for long periods of time, (b) the system was also characterised as a function of power supply operating conditions such as voltage, current, gas pressure and plasma density.en_US
dc.identifier.urihttps://hdl.handle.net/10566/16652
dc.language.isoenen_US
dc.publisherUniversity of the Western Capeen_US
dc.rights.holderUniversity of the Western Capeen_US
dc.subjectPlasma lmmersion lon lmplantation (P13) techniqueen_US
dc.subjectlntense pulsed neutron generatoren_US
dc.subjectMono-energetic neutronsen_US
dc.subjectD-D and D-T reactionsen_US
dc.subjectTitanium targeten_US
dc.subjectHV pulse power supplyen_US
dc.subjectPlasma chamberen_US
dc.subjectRF power supplyen_US
dc.subjectNeutron monitor and detectorsen_US
dc.subjectNeutron detection techniquesen_US
dc.titleIntense pulsed neutron generation based on the principle of plasma immersion ion implantation technique (PIp3s) techniqueen_US

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