Determination of the gas-flow patterns inside the hot-wire chemical vapor deposition system, using computational fluids dynamics software (fluent)

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dc.contributor.advisorKnoesen, Dirk
dc.contributor.authorWittes, Thobeka
dc.contributor.otherDept. of Physics
dc.contributor.otherFaculty of Science
dc.date.accessioned2014-01-17T06:55:19Z
dc.date.accessioned2024-10-30T10:24:09Z
dc.date.available2011/07/18 13:35
dc.date.available2011/07/18
dc.date.available2014-01-17T06:55:19Z
dc.date.available2024-10-30T10:24:09Z
dc.date.issued2009
dc.descriptionMagister Scientiae - MScen_US
dc.description.abstractComputational Fluid Dynamics is the analysis of a system involving fluid flow, heat transfer and associated phenomena such as chemical reactions by means of a computer-based simulation. The simulations in this study are performed using (CFD) software package FLUENT. The mixture of two gases (Silane gas (SiH4) and Hydrogen gas (H2)) are delivered into the hot-wire chemical vapor deposition system (HWCVD) with the two deposited substrates (glass and Silicon). This process is performed by the solar cells group of the Physics department at the University of the Western Cape. In this thesis, the simulation is done using a CFD software package FLUENT, to model the gas-flow patterns inside the HWCVD system. This will show how the gas-flow patterns are affected by the varying temperature of the heater in each simulation performed in this study under a constant pressure of 60μBar of the system.en_US
dc.description.countrySouth Africa
dc.identifier.urihttps://hdl.handle.net/10566/16721
dc.language.isoenen_US
dc.publisherUniversity of the Western Capeen_US
dc.rights.holderUniversity of the Western Capeen_US
dc.subjectCFDen_US
dc.subjectHWCVDen_US
dc.subjectGas flowen_US
dc.subjectSilaneen_US
dc.subjectHydrogenen_US
dc.titleDetermination of the gas-flow patterns inside the hot-wire chemical vapor deposition system, using computational fluids dynamics software (fluent)en_US
dc.typeThesisen_US

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