Browsing by Author "Knoesen, Dirk"
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Item Characterization of silicon nitride thin films deposited by hot-wire CVD at low gas flow rates(Elsevier, 2013) Oliphant, Clive J.; Arendse, Christopher; Muller, Theophillus F.G.; Knoesen, DirkWe examined the chemical, structural, mechanical and optical properties of amorphous hydrogenatedsilicon nitride thin films deposited by hot-wire chemical vapour deposition using SiH4, NH3and H2gases at total flow rates below 33 sccm. Time of flight secondary ion mass spectroscopy reveal that thefilm surfaces consist of predominantly Si with hydrogenated SixNyOzspecies. Energy dispersive X-rayspectroscopy and X-ray photoelectron spectroscopy corroborate on the N/Si ratio. Electron energy lossspectroscopy discloses that the thickness of the nitrogen rich oxidized interface between the SiNxfilmsand the c-Si substrate decrease with an enhancing NH3flow rate. By varying the NH3flow rate, denseSiNxfilms can be realized with hydrogen content between 16 and 9 at.%, a refractive index between 3.5and 1.9 and optical band gap ranging from 2 to 4.5 eV. The SiNxfilm stress is compressive for N/Si < 0.4and tensile for higher N/Si > 0.55. Mechanisms relating the HWCVD conditions and the film structure andproperties are proposed.Item Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process(2010) Lebogang, Kotsedi; Knoesen, Dirk; Madjoe, ReginaldtWhen the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell.A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon.In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity.The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped.A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity.Item Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process(University of the Western Cape, 2010) Kotsedi, Lebogang; Knoesen, Dirk; Madjoe, Reginaldt; Dept. of PhysicsWhen the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell. A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon. In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity. The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped. A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity.Item Optical modeling of amorphous and metal induced crystallized silicon with an effective medium approximation(University of the Western Cape, 2009) Muller, Theophillus Frederic George; Knoesen, Dirk; Arendse, Christopher; Dept. of Physics; Faculty of ScienceIn this thesis we report on the metal-mediated-thermally induced changes of the structural and optical properties of hydrogenated amorphous silicon deposited by hot-wire CVD, where aluminium and nickel were used to induce crystallization. The metal-coated amorphous silicon was subjected to a thermal annealing regime of between 150 and 520°C. The structural measurements, obtained by Raman spectroscopy, show partial crystallization occurring at 350 °C. At the higher annealing temperatures of 450°C and 520°C complete crystallization occurs. Reflection and transmission measurements in the UV-visible range were then used to extract the optical properties. By adopting the effective medium approximation a single optical model could be constructed that could successfully model material that was in different structural phases, irrespective of metal contamination. Changes in the absorption of the material in various stages of transition were confirmed with a directly measured absorption technique, and the modelled absorption closely followed the same trends This study forms part of the larger overall solar cell research project, of which the primary aim is to eventually develop a silicon solar panel that optimises the characteristics for best performance.Item A study of hydrogenated nanocrystalline silicon thin films deposited by hot-wire chemical vapour deposition (HWCVD)(University of the Western Cape, 2005) Halindintwali, Sylvain; Knoesen, Dirk; Dept. of Physics; Faculty of ScienceIn this thesis, intrinsic hydrogenated nanocrystalline silicon thin films for solar cells application have been deposited by means of the hot – wire chemical vapour deposition (HWCVD) technique and have been characterised for their performance. It is noticed that hydrogenated nanocrystalline silicon is similar in some aspects (mainly optical) to its counterpart amorphous silicon actually used as the intrinsic layer in the photovoltaic industry. Substantial differences between the two materials have been found however in their respective structural and electronic properties. We show that hydrogenated nanocrystalline silicon retains good absorption coefficients known for amorphous silicon in the visible region. The order improvement and a reduced content of the bonded hydrogen in the films are linked to their good stability. We argue that provided a moderate hydrogen dilution ratio in the monosilane gas and efficient process pressure in the deposition chamber, intrinsic hydrogenated nanocrystalline silicon with photosensitivity better than 102 and most importantly resistant to the Staebler Wronski effect (SWE) can be produced. This work explores the optical, structural and electronic properties of this promising material whose study – samples have been exclusively produced in the HWCVD reactors based in the Solar Cells laboratory of the Physics department at the University of the Western Cape.Item Towards stimuli-responsive functional nanocomposites: smart tunable plasmonic nanostructures Au-VO2(University of the Western Cape, 2010) Kana, Jean Bosco Kana; Maaza, Malik; Knoesen, Dirk; Dept. of Physics; Faculty of ScienceThe fascinating optical properties of metallic nanostructures, dominated by collective oscillations of free electrons known as plasmons, open new opportunities for the development of devices fabrication based on noble metal nanoparticle composite materials. This thesis demonstrates a low-cost and versatile technique to produce stimuli-responsive ultrafast plasmonic nanostructures with reversible tunable optical properties. Albeit challenging, further control using thermal external stimuli to tune the local environment of gold nanoparticles embedded in VO2 host matrix would be ideal for the design of responsive functional nanocomposites. We prepared Au-VO2 nanocomposite thin films by the inverted cylindrical reactive magnetron sputtering (ICMS) known as hollow cathode magnetron sputtering for the first time and report the reversible tuning of surface plasmon resonance of Au nanoparticles by only adjusting the external temperature stimuli. The structural, morphological, interfacial analysis and optical properties of the optimized nanostructures have been studied. ICMS has been attracting much attention for its enclosed geometry and its ability to deposit on large area, uniform coating of smart nanocomposites at high deposition rate. Before achieving the aforementioned goals, a systematic study and optimization process of VO2 host matrix has been done by studying the influence of deposition parameters on the structural, morphological and optical switching properties of VO2 thin films. A reversible thermal tunability of the optical/dielectric constants of VO2 thin films by spectroscopic ellipsometry has been intensively also studied in order to bring more insights about the shift of the plasmon of gold nanoparticles imbedded in VO2 host matrix.